Ammonia hydrolysis reaction process
Reaction principle: Starting from dimethyldichlorosilane, it undergoes ammonolysis with ammonia in the presence of a solvent to produce octamethylcyclotetrasilazane.
Reaction steps:
Raw material preparation: Dissolve dimethyl dichlorosilane in organic solvents such as toluene to prepare a solution of a certain concentration.
Ammonia hydrolysis reaction: Under temperature conditions of 15-18 ℃, ammonia gas is introduced into the above solution or ammonia water is added dropwise to carry out the ammonia hydrolysis reaction. The reaction equation can be expressed as: 4 (CH ∝) ₂ SiCl ₂+8NH ∝ → (CH ∝) ₈ Si ₄ N ₄+8NH ₄ Cl.
Post treatment: After the reaction is complete, dissolve the by-product ammonium chloride in ammonia water, and separate the octamethylcyclotetrasilazane product through filtration, washing, distillation, and other operations. When the raw material concentration is 2.07mol/L, the product yield can reach 59%.
Alkali catalyzed condensation process
Reaction principle: Utilizing silane compounds containing silicon hydroxyl groups to undergo condensation reaction under the action of alkaline catalysts, generating octamethylcyclotetrasilazane.
Reaction steps:
Raw material selection: Choose suitable silane compounds containing silicon hydroxyl groups, such as dimethylsilanediol.
Condensation reaction: Under the action of alkaline catalysts such as sodium hydroxide, potassium hydroxide, etc., condensation reaction is carried out at a certain temperature and reaction time. Alkali catalysts can promote dehydration condensation reactions between silicon hydroxyl groups, forming silicon nitrogen bonds.
Product separation: After the reaction is completed, the reaction product is separated and purified by methods such as vacuum distillation and extraction to obtain octamethylcyclotetrasilazane.
Gas deposition process
Reaction principle: Using chemical vapor deposition technology, gaseous precursors containing silicon, nitrogen, and other elements are decomposed and reacted under high temperature, plasma, and other conditions to deposit octamethylcyclotetrasilazane thin films or coatings on the substrate surface.
Reaction steps:
Precursor selection: Choose a suitable gaseous precursor, such as dimethylsilylamine.
Deposition process: Introduce gaseous precursor into the reaction chamber, and under the action of high temperature, plasma, etc., the precursor decomposes and undergoes chemical reactions. Silicon, nitrogen and other atoms deposit and react on the substrate surface to form octamethylcyclotetrasilazane.
Post processing: Annealing, cleaning, and other post-processing operations are performed on the deposited products to improve their quality and performance.
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