The film-forming properties of polysilazane are influenced by various factors, including:
1. Solvent type
Different solvents have different solubility and volatilization characteristics for polysilazane. If the solvent evaporates too quickly, it may cause the polysilazane to dry quickly before it can spread evenly, resulting in a film that is prone to defects such as pores and uneven thickness; If the evaporation rate is too slow, the film-forming time will be greatly prolonged, and solvents may remain in the film, affecting the density and performance of the film. Organic solvents such as toluene and xylene are often used to dissolve polysilazane to assist in film formation, and their selection and usage can affect the film formation effect.
2. Structure and molecular weight of polysilazane itself
In terms of structure, the degree of branching of the molecular chain, the type and size of the side groups, etc. can change the intermolecular forces and the flexibility of the chain segments. For example, polysilazanes with larger volume side groups have limited mobility of their molecular chains, making it difficult for the chain segments to fully stretch and interweave during film formation, thereby affecting the flatness and continuity of the film.
Molecular weight size: When the molecular weight is low, the flowability of polysilazane is good, which is conducive to the rapid spreading and formation of thin films on the substrate surface, but the mechanical strength of the film may be relatively weak; If the molecular weight is too high, its viscosity is high, making it difficult to form a uniform film and prone to local accumulation.
3. Properties of the substrate
Surface energy: The surface energy of the substrate affects the wettability of polysilazane on it. If the surface energy of the substrate is low, it is difficult for the polysilazane solution to spread on its surface, which is prone to condensation and cannot form a continuous and complete film; A substrate with high surface energy is beneficial for the spreading of polysilazane solution and film formation. For example, the film-forming effect on hydrophilic glass substrates may be better than on certain hydrophobic plastic substrates.
Roughness: If the roughness of the substrate surface is large, the polysilazane solution may not form a uniform and smooth film on its surface due to unevenness, and may accumulate in depressions. The film on protrusions may be thin or even unable to cover, affecting the overall quality of the film.
4. Environmental conditions
Temperature: Higher temperatures can accelerate the evaporation rate of solvents and may also affect the movement state of polysilazane molecular chains. A suitable temperature can orderly arrange polysilazane into a film during the solvent evaporation process. Excessive or insufficient temperature can lead to film formation problems, such as film cracking or inability to dry and cure.
Humidity: When the environmental humidity is high, water vapor may mix into the polysilazane solution, which may change the concentration and viscosity of the solution. On the other hand, after film formation, residual water vapor can easily cause defects such as bubbles in the film, damaging its integrity and density.
5. Coating process
Coating methods: Common methods such as spin coating, spray coating, and dip coating each have their own characteristics. Spin coating can obtain films with relatively uniform thickness, but its efficiency is low for large-area coating; Spraying can achieve rapid coating over a large area, but the uniformity of the film is difficult to accurately control; The immersion coating operation is relatively simple, but it is prone to problems such as uneven film thickness and edge effects. Different coating methods have a significant impact on the final film-forming properties of polysilazane.
Coating parameters, such as rotation speed and time during spin coating, pressure and distance during spraying, can affect the distribution of polysilazane solution on the substrate and the quality of film formation.

Room termperature curing polysilazane, pls check IOTA 9150, IOTA 9150K.       
High termperature curing polysilazane, pls check IOTA 9108, IOTA 9118.