Chemical vapor deposition method
Preparation of reaction gases: Select appropriate reaction gases, such as metal organic compounds, hydrogen, nitrogen, methane, etc. These gases will undergo chemical reactions under certain conditions to form the composition of high-temperature resistant coatings.
Substrate pretreatment: Pre treatment such as cleaning and activation of the substrate surface to improve the adhesion and quality of the coating.
Deposition reaction: Place the substrate in a reaction furnace, introduce reaction gas, and under the action of high temperature, catalyst, etc., the reaction gas undergoes a chemical reaction on the surface of the substrate, producing solid products that deposit on the surface of the substrate, forming a high-temperature resistant coating.
Process optimization: By adjusting process parameters such as reaction temperature, pressure, gas flow rate, and reaction time, the performance and quality of the coating are optimized.

Room termperature curing polysilazane, pls check IOTA 9150, IOTA 9150K. 
High termperature curing polysilazane, pls check IOTA 9108, IOTA 9118.